Photolithography at Lincoln Laboratory

Ғылым және технология

Lincoln Laboratory's Microelectronics Laboratory is the only non-commercial silicon wafer fabrication facility in the United States with the ability to optically print features as small as 100 nanometers. With this ability, our staff are developing unique integrated circuit capabilities, including fully depleted silicon-on-insulator CMOS circuits, integrated photonics for trapped-ion systems, low-cost electronically steered phased array antennas, and other versatile circuit designs.
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MIT Lincoln Laboratory, founded in 1951, applies advanced technology to problems of national security. Research and development activities focus on long-term technology development as well as rapid system prototyping and demonstration. The Laboratory works with industry to transition new concepts and technology for system development and deployment.

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