The resist can be positive or negative. Depending on whether it's a positive or negative resist, the exposed resist can be removed or retained respectively, after the development.

You said: "In development, only the parts of the resist that have been exposed by EBL, will be removed. But this is only true if the resist is a positive resist. If you use a negative resist, all the exposed parts are going to be hardened , and after the development, only the unexposed areas get removed.

Graduate student here, thank you so much for this series. I'll definitely be recommending this in the future!

@Yuchub33

2 жыл бұрын

same xD

Thank you for very good explanation. Your speaking is clear and catchable. It’s easy to understand.

Thank you for this series You helped me a lot in my work

brilliant video, thanks

Very informative, thanks.

thank you so much for a such good demonstration

Hi it is very useful for thanks alot for your great Videos. olease create more such these videos in cleanroom. Best regards Nazli

thank you very much for the video. Could you please tell me what are the reasons of the apparance of the stitching lines und why some lithography machine cause this problem and other dont cause this problem?? thank you!

Very useful, Thanks.

Thank you, very helpful

thank you for sharing

very informative video.....

which resist have you used and what was it's thickness after 5000rpm for 40seconds?

Thanku so much 😊😊

How does the acetone reach the EBL resist under the deposited metal layer?

Спасибо)

How can I design the lens and beam deflector, what are some books that can be recommended?

its just a crt display, can be directly ripped out of the existing hardware, or 3d printer style printer head moving by small straight on-off electron jet source, you dont even have to use electrons, you can use direct embedding particles, direct printing, picoelectronics and picoelectromechanic systems

Do you know the resolution of the magnitude of the magnetic field used to deflect the electron beam

@dukeuniversity-smif2466

3 жыл бұрын

I don’t know the actual magnitude of the magnetic field generated by the deflection coils. However, regarding beam position resolution: beam positioning is controlled with an 18-bit digital-to-analog controller. The maximum number of discrete positions (horizontally or vertically) is 240,000. The smallest exposure area of the system is 75 micrometers (vertically and horizontally). Thus, the spatial resolution is 75um / 240,000; that is approximately 0.3nm! Just for reference, a human red blood cell is approximately 8,000 nm in diameter… and a human hair is approximately 50,000 - 80,000 nm thick.

EBL just work like the old Cathode Ray Tube TV screen. I am not surprised if China is working on the LED-like beam flat panel Lithography machine now! It should be just a efficient as the Photolithography machine but cheaper!

examples of metals used in lift off??

@dukeuniversity-smif2466

3 жыл бұрын

Chromium, titanium, aluminum, gold, silver, nickel and more

So it's a like an old vacuum tube TV