Chemical vapor deposition like all semiconductor processes seeks to produce extreme uniformity. This is why most semiconductor equipment companies use Ansys simulation tools to model flow and electromagnetics.
During this webinar we will look at different levels of simulations that can benefit companies developing semiconductor processing equipment.
- Geometry simplification
- Flow and mixing simulation
- Transient time dependent simulation
- Surface reactions and chemistry
During this webinar we will demonstrate MRI system setup in ANSYS Electronic Desktop, and running the simulation to calculate the SAR value with HFSS.